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論文 TSV

2023
  1. Kota Hasegawa, Takao Shimizu, Naoki Ohashi. In-plane lattice orientation in aluminum scandium nitride epitaxial films deposited on Nb-doped SrTiO3(111) substrates via reactive magnetron sputtering. Journal of the Ceramic Society of Japan. 131 [7] (2023) 23002 10.2109/jcersj2.23002 Open Access
  2. Shinnosuke Yasuoka, Ryoichi Mizutani, Reika Ota, Takahisa Shiraishi, Takao Shimizu, Kazuki Okamoto, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Hiroshi Funakubo. Invariant polarization switching kinetics in an (Al0.8Sc0.2)N film with frequency and temperature. Applied Physics Letters. 123 [20] (2023) 202902 10.1063/5.0171108
  3. Kota Hasegawa, Takao Shimizu, Takeo Ohsawa, Isao Sakaguchi, Naoki Ohashi. Full polarization reversal at room temperature in unsubstituted AlN. Applied Physics Letters. 123 [19] (2023) 192903 10.1063/5.0174236
  4. Kodai Aoyama, Takao Shimizu, Hideto Kuramochi, Masami Mesuda, Ryo Akiike, Takayoshi Katase, Yoshisato Kimura, Hiroshi Funakubo. Enhanced Thermoelectric Properties of SrSi2 Composite Films with Cubic and Layered Polymorphs. ACS Applied Energy Materials. 6 [12] (2023) 6593-6597 10.1021/acsaem.3c00577 Open Access
  5. Akinori Tateyama, Yuichiro Orino, Yoshiharu Ito, Takahisa Shiraishi, Takao Shimizu, Minoru Kuribayashi Kurosawa, Hiroshi Funakubo. Simultaneous high-frequency measurement of direct and inverse transverse piezoelectric coefficients of thin films using longitudinal vibration. Sensors and Actuators A: Physical. 354 (2023) 114265 10.1016/j.sna.2023.114265
  6. Takanori Mimura, Yuki Tashiro, Takao Shimizu, Hiroshi Funakubo. Systematic Investigation of Ferroelectric Properties in x%YO1.5–(100–x%)Hf1–yZryO2 Films. ACS Applied Electronic Materials. 5 [3] (2023) 1600-1605 10.1021/acsaelm.2c01658
2022
  1. Takanori Mimura, Takao Shimizu, Hiroshi Funakubo. Preparation of orthorhombic Y-doped TaON film. Journal of the Ceramic Society of Japan. 130 [7] (2022) 22002 10.2109/jcersj2.22002 Open Access
  2. Masanori Kodera, Keisuke Ishihama, Takao Shimizu, Hiroshi Funakubo. Preferential growth of (001)-oriented Bi2SiO5 thin films deposited on (101)-oriented rutile substrates and their ferroelectric and dielectric properties. Scientific Reports. 12 [1] (2022) 15204 10.1038/s41598-022-19058-y Open Access
  3. Shinnosuke Yasuoka, Ryoichi Mizutani, Reika Ota, Takahisa Shiraishi, Takao Shimizu, Shintaro Yasui, Yoshitaka Ehara, Ken Nishida, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Yasuhiko Imai, Osami Sakata, Hiroshi Funakubo. Enhancement of crystal anisotropy and ferroelectricity by decreasing thickness in (Al,Sc)N films. Journal of the Ceramic Society of Japan. 130 [7] (2022) 21184 10.2109/jcersj2.21184 Open Access
  4. Kota Hasegawa, Takao Shimizu, Naoki Ohashi. Lattice deformation and phase transition of aluminum nitride studied by density functional theory calculations. Journal of the Ceramic Society of Japan. 130 [7] (2022) 21190 10.2109/jcersj2.21190 Open Access
  5. Yoshitaka Ehara, Takaaki Nakashima, Daichi Ichinose, Takao Shimizu, Takahisa Shiraishi, Osami Sakata, Tomoaki Yamada, Shintaro Yasui, Ken Nishida, Hiroshi Funakubo. Film thickness dependence of in-plane ferroelastic domain structure in constrained tetragonal PbTiO3 films induced by isotropic tensile strain. Applied Physics Letters. 121 [26] (2022) 262901 10.1063/5.0119843
  6. Shinnosuke Yasuoka, Ryoichi Mizutani, Reika Ota, Takahisa Shiraishi, Takao Shimizu, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Hiroshi Funakubo. Tunable Ferroelectric Properties in Wurtzite (Al0.8Sc0.2)N via Crystal Anisotropy. ACS Applied Electronic Materials. 4 [11] (2022) 5165-5170 10.1021/acsaelm.2c00999
  7. Reijiro Shimura, Takanori Mimura, Akinori Tateyama, Takahisa Shiraishi, Takao Shimizu, Tomoaki Yamada, Yoshitomo Tanaka, Yukari Inoue, Hiroshi Funakubo. No‐Heating Deposition of 1‐μm‐Thick Y‐Doped HfO2 Ferroelectric Films with Good Ferroelectric and Piezoelectric Properties by Radio Frequency Magnetron Sputtering Method. physica status solidi (RRL) – Rapid Research Letters. 16 [10] (2022) 10.1002/pssr.202100574
  8. Masato Uehara, Ryouichi Mizutani, Shinnosuke Yasuoka, Takao Shimizu, Hiroshi Yamada, Morito Akiyama, Hiroshi Funakubo. Lower ferroelectric coercive field of ScGaN with equivalent remanent polarization as ScAlN. Applied Physics Express. 15 [8] (2022) 081003 10.35848/1882-0786/ac8048 Open Access
  9. Pratyush Buragohain, Adam Erickson, Takanori Mimura, Takao Shimizu, Hiroshi Funakubo, Alexei Gruverman. Effect of Film Microstructure on Domain Nucleation and Intrinsic Switching in Ferroelectric Y:HfO 2 Thin Film Capacitors. Advanced Functional Materials. 32 [9] (2022) 2108876 10.1002/adfm.202108876
  10. Tomoya Sato, Masanori Kodera, Daichi Ichinose, Takanori Mimura, Takao Shimizu, Tomoaki Yamada, Hiroshi Funakubo. Domain structures induced by tensile thermal strain in epitaxial PbTiO3 films on silicon substrates. Journal of Applied Physics. 131 [3] (2022) 035301 10.1063/5.0074884
  11. Yoshiharu Ito, Akinori Tateyama, Rurika Kubota, Takahisa Shiraishi, Takao Shimizu, Jaemyung Kim, Okkyun Seo, Osami Sakata, Minoru Kurosawa, Hiroshi Funakubo. Polar-axis-oriented epitaxial tetragonal (Bi,K)TiO3 films with large remanent polarization deposited below Curie temperature by a hydrothermal method. Applied Physics Letters. 120 [2] (2022) 022903 10.1063/5.0075014
2021
  1. Keisuke ISHIHAMA, Masanori KODERA, Takao SHIMIZU, Wakiko YAMAOKA, Risako TSURUMARU, Shintaro YOSHIMURA, Yusuke SATO, Hiroshi FUNAKUBO. Growth of 0.1(Bi,Na)TiO3–0.9BaTiO3 epitaxial films by pulsed laser deposition and their electric properties. Journal of the Ceramic Society of Japan. 129 [7] (2021) 21002 10.2109/jcersj2.21002 Open Access
  2. 清水 荘雄, 三村 和仙, 舟窪 浩. HfO2基材料における強誘電性の発現機構. Ceramics Japan. (2021) 455-458
  3. 舟窪 浩, 安岡 慎之介, 水谷 涼一, 清水 荘雄. ウルツ鉱構造窒化物の強誘電性. Ceramics Japan. (2021) 443-446
  4. 江原 祥隆, 清水 荘雄, 舟窪 浩. 高速電界印加時のドメイン構造変化を利用した高性能PZT薄膜の開発. Ceramics Japan. (2021) 459-462
  5. Takao Shimizu, Miyu Hasegawa, Keisuke Ishihama, Akinori Tateyama, Wakiko Yamaoka, Risako Tsurumaru, Shintaro Yoshimura, Yusuke Sato, Hiroshi Funakubo. Large Piezoelectric Response in Lead-Free (Bi0.5Na0.5)TiO3-Based Perovskite Thin Films by Ferroelastic Domain Switching: Beyond the Morphotropic Phase Boundary Paradigm. ACS Applied Materials & Interfaces. 13 [48] (2021) 57532-57539 10.1021/acsami.1c15713
  6. Takanori Mimura, Takao Shimizu, Osami Sakata, Hiroshi Funakubo. Thickness dependence of phase stability in epitaxial (HfxZr1−x)O2 films. Physical Review Materials. 5 [11] (2021) 114407 10.1103/physrevmaterials.5.114407
  7. Yoshitaka Ehara, Daichi Ichinose, Masanori Kodera, Takahisa Shiraishi, Takao Shimizu, Tomoaki Yamada, Ken Nishida, Hiroshi Funakubo. Influence of cooling rate on ferroelastic domain structure for epitaxial (100)/(001)-oriented Pb(Zr, Ti)O3 thin films under tensile strain. Japanese Journal of Applied Physics. 60 [SF] (2021) SFFB07 10.35848/1347-4065/ac10f7
  8. Masato Uehara, Ryoichi Mizutani, Shinnosuke Yasuoka, Takahisa Shiraishi, Takao Shimizu, Hiroshi Yamada, Morito Akiyama, Hiroshi Funakubo. Demonstration of ferroelectricity in ScGaN thin film using sputtering method. Applied Physics Letters. 119 [17] (2021) 172901 10.1063/5.0068059
  9. Keisuke Ishihama, Takao Shimizu, Wakiko Yamaoka, Risako Tsurumaru, Shintaro Yoshimura, Yusuke Sato, Hiroshi Funakubo. Composition dependencies of crystal structure and electrical properties of epitaxial tetragonal (Bi, Na)TiO3–BaTiO3 films grown on (100)cSrRuO3//(100)SrTiO3 substrates by pulsed laser depositions. Journal of Applied Physics. 130 [13] (2021) 134102 10.1063/5.0063385
  10. Ryoichi Mizutani, Shinnosuke Yasuoka, Takahisa Shiraishi, Takao Shimizu, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Osami Sakata, Hiroshi Funakubo. Thickness scaling of (Al0.8Sc0.2)N films with remanent polarization beyond 100 μC cm−2 around 10 nm in thickness. Applied Physics Express. 14 [10] (2021) 105501 10.35848/1882-0786/ac2261
  11. Shinnosuke Yasuoka, Takao Shimizu, Akinori Tateyama, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Hiroshi Funakubo. Impact of Deposition Temperature on Crystal Structure and Ferroelectric Properties of (Al 1− x Sc x )N Films Prepared by Sputtering Method. physica status solidi (a). 218 [17] (2021) 2100302 10.1002/pssa.202100302
  12. Yuki Tashiro, Takao Shimizu, Takanori Mimura, Hiroshi Funakubo. Comprehensive Study on the Kinetic Formation of the Orthorhombic Ferroelectric Phase in Epitaxial Y-Doped Ferroelectric HfO2 Thin Films. ACS Applied Electronic Materials. 3 [7] (2021) 3123-3130 10.1021/acsaelm.1c00342
  13. Takao Shimizu, Yuki Tashiro, Takanori Mimura, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko J. Konnno, Osami Sakata, Hiroshi Funakubo. Electric‐Field‐Induced Ferroelectricity in 5%Y‐doped Hf 0.5 Zr 0.5 O 2 : Transformation from the Paraelectric Tetragonal Phase to the Ferroelectric Orthorhombic Phase. physica status solidi (RRL) – Rapid Research Letters. 15 [5] (2021) 2000589 10.1002/pssr.202000589
  14. Takanori Mimura, Takao Shimizu, Osami Sakata, Hiroshi Funakubo. Large thermal hysteresis of ferroelectric transition in HfO2-based ferroelectric films. Applied Physics Letters. 118 [11] (2021) 112903 10.1063/5.0040934
  15. Reijiro Shimura, Takanori Mimura, Akinori Tateyama, Takao Shimizu, Tomoaki Yamada, Yoshitomo Tanaka, Yukari Inoue, Hiroshi Funakubo. Preparation of 1 μm thick Y-doped HfO2 ferroelectric films on (111)Pt/TiO x /SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties. Japanese Journal of Applied Physics. 60 [3] (2021) 031009 10.35848/1347-4065/abe72e
  16. Daichi Ichinose, Takao Shimizu, Osami Sakata, Tomoaki Yamada, Yoshitaka Ehara, Hiroshi Funakubo. Domain structure transition in compressively strained (100)/(001) epitaxial tetragonal PZT film. Journal of Applied Physics. 129 [2] (2021) 024101 10.1063/5.0031803
2020
  1. Hiroki Moriwake, Rie Yokoi, Ayako Taguchi, Takafumi Ogawa, Craig A. J. Fisher, Akihide Kuwabara, Yukio Sato, Takao Shimizu, Yosuke Hamasaki, Hiroshi Takashima, Mitsuru Itoh. A computational search for wurtzite-structured ferroelectrics with low coercive voltages. APL Materials. 8 [12] (2020) 121102 10.1063/5.0023626 Open Access
  2. Masanori Kodera, Takao Shimizu, Hiroshi Funakubo. Epitaxial Crystal Growth of Bismuth Silicate Driven by Fluorite-like Layers. Crystal Growth & Design. 20 [11] (2020) 7163-7169 10.1021/acs.cgd.0c00754
  3. Yoshitaka Ehara, Takaaki Nakashima, Daichi Ichinose, Takao Shimizu, Tomoaki Yamada, Ken Nishida, Hiroshi Funakubo. Temperature dependence on the domain structure of epitaxial PbTiO3 films grown on single crystal substrates with different lattice parameters. Japanese Journal of Applied Physics. 59 [SP] (2020) SPPB01 10.35848/1347-4065/aba2bf
  4. Akinori Tateyama, Yoshiharu Ito, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Takeshi Yoshimura, Hiroshi Funakubo. Dependency of direct and inverse transverse piezoelectric properties on composition in self-polarized epitaxial (K x Na1−x )NbO3 films grown via a hydrothermal method. Japanese Journal of Applied Physics. 59 [SP] (2020) SPPC03 10.35848/1347-4065/aba9b3
  5. Akinori Tateyama, Yoshiharu Ito, Yoshiko Nakamura, Takao Shimizu, Yuichiro Orino, Minoru Kurosawa, Hiroshi Uchida, Takahisa Shiraishi, Takanori Kiguchi, Toyohiko J. Konno, Takeshi Yoshimura, Hiroshi Funakubo. Good piezoelectricity of self-polarized thick epitaxial (K,Na)NbO3 films grown below the Curie temperature (240 °C) using a hydrothermal method. Applied Physics Letters. 117 [14] (2020) 142903 10.1063/5.0017990
  6. Shinnosuke Yasuoka, Takao Shimizu, Akinori Tateyama, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Yoshiomi Hiranaga, Yasuo Cho, Hiroshi Funakubo. Effects of deposition conditions on the ferroelectric properties of (Al1−xScx)N thin films. Journal of Applied Physics. 128 [11] (2020) 114103 10.1063/5.0015281
  7. Mitsumasa Nakajima, Takao Shimizu, Hiroshi Nakaki, Tomoaki Yamada, Ayumi Wada, Takaaki Nakashima, Yoshitaka Ehara, Hiroshi Funakubo. Large Electromechanical Responses Driven by Electrically Induced Dense Ferroelastic Domains: Beyond Morphotropic Phase Boundaries. ACS Applied Electronic Materials. 2 [7] (2020) 1908-1916 10.1021/acsaelm.0c00220
  8. Takanori Mimura, Takao Shimizu, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films. Japanese Journal of Applied Physics. 59 [SG] (2020) SGGB04 10.35848/1347-4065/ab6d84
2019
  1. Yoshitaka Ehara, Takao Shimizu, Shintaro Yasui, Takahiro Oikawa, Takahisa Shiraishi, Hiroki Tanaka, Noriyuki Kanenko, Ronald Maran, Tomoaki Yamada, Yasuhiko Imai, Osami Sakata, Nagarajan Valanoor, Hiroshi Funakubo. Ferroelastic domain motion by pulsed electric field in (111)/(111¯) rhombohedral epitaxial Pb(Zr0.65Ti0.35)O3 thin films: Fast switching and relaxation. Physical Review B. 100 [10] (2019) 104116 10.1103/physrevb.100.104116
2018
  1. Takao Shimizu, Takanori Mimura, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Ferroelectricity mediated by ferroelastic domain switching in HfO2-based epitaxial thin films. Applied Physics Letters. 113 [21] (2018) 212901 10.1063/1.5055258

書籍 TSV

会議録 TSV

口頭発表 TSV

2023
  1. 長谷川 浩太, SHIMIZU, Takao, OHSAWA, Takeo, SAKAGUCHI, Isao, OHASHI, Naoki. Demonstration of ferroelectricity in non-substituted AlN thin films fabricated by sputtering method. MNC2023. 2023
  2. SHIMIZU, Takao, 舟窪 浩, OHASHI, Naoki. Paving the road toward applications with simple compound ferroelectrics. he 13th Asian Meeting on Ferroelectrics jointly with the 13th Asian Meeting on Electroceramics (AMF-13 & AMEC-13). 2023 招待講演
  3. 大橋 直樹, 齋藤 紀子, 清水 荘雄, 大澤 健男, 斎藤典夫. 無機材料屋から見た有機・無機ハイブリッド結晶. 第43回電子材料研究討論会. 2023
  4. 清水 荘雄, 長谷川 浩太, 大橋 直樹. ウルツ鉱型強誘電体における分極反転ダイナミクス~第一原理計算による検討~. 第43回電子材料研究討論会. 2023
  5. 長谷川 浩太, 清水 荘雄, 大澤 健男, 坂口 勲, 大橋 直樹. ウルツ鉱型強誘電体における分極反転ダイナミクス~実験的検討~. 第43回電子材料研究討論会. 2023
  6. 長谷川 浩太, 清水 荘雄, 大澤 健男, 坂口 勲, 大橋 直樹. AlN薄膜における低電界での分極反転過程の観測. 第84回応用物理学会秋季学術講演会. 2023
  7. 清水 荘雄, 青山 航大, 倉持 豪人, 召田 雅実, 秋池 良, 片瀬 貴義, 木村 好里, 舟窪 浩. 二相共存SrSi2における熱電特性. 日本セラミックス協会 第36回秋季シンポジウム. 2023
  8. SHIMIZU, Takao, 長谷川 浩太, OHSAWA, Takeo, SAKAGUCHI, Isao, OHASHI, Naoki. Ferroelectricity in non-doped AlN with wurtzite structure. Beyond Imperfections: New Structure-Property Relationships in Ceramics and Glasses . 2023
  9. 長谷川 浩太, 清水 荘雄, 大澤 健男, 坂口 勲, 大橋 直樹. スパッタ法で作製したAlN薄膜の強誘電体特性評価. 第70回応用物理学会春季学術講演会. 2023
2022
  1. 長谷川 浩太, 大澤 健男, 清水 荘雄, 坂口 勲, 大橋 直樹. (Al,Sc)N 薄膜中に含まれる不純物酸素の光電子分光評価. 第42回電子材料研究討論会. 2022
  2. 清水 荘雄, 舟窪 浩, 大橋 直樹. Materials Aspects of New Ferroelectrics with Simple Crystal Structure. 242nd ECS Meeting. 2022 招待講演
  3. 長谷川 浩太, 清水 荘雄, 大澤 健男, 坂口 勲, 大橋 直樹. スパッタ法で作製した(Al,Sc)N薄膜中の不純物酸素の検討. 2022年 第83回応用物理学会秋季学術講演会. 2022
  4. 清水 荘雄, 江原 祥隆, 坂田 修身, 舟窪 浩. 時間分解X線回折によるPZTのドメインスイッチングにおける周期電場の影響の研究. 日本物理学会 2022年秋季大会. 2022
  5. 清水 荘雄, 舟窪 浩, 大橋 直樹. 新規非ペロブスカイト型強誘電体の開発. 第39回強誘電体会議. 2022 招待講演
  6. 長谷川 浩太, 清水 荘雄, 陳 君, 大澤 健男, 坂口 勲, 大橋 直樹. Nb:SrTiO3基板上のエピタキシャル(Al,Sc)N薄膜における強誘電体特性. 2022年第69回応用物理学会春季学術講演会. 2022
  7. 三村 和仙, 清水 荘雄, 坂田 修身, 舟窪 浩. HfO2基強誘電体の相転移における熱履歴. 日本物理学会 第77回年次大会(2022年). 2022
2021
  1. 古谷 拓海, 大沢 祐太, 瀬川 浩代, 清水 荘雄, 宮川 仁, 西村 聡之, 大橋 直樹. Synthesis of the LaTiO2N bulk ceramic and the dielectric properties. Materials Research Meeting 2021 (MRM2021). 2021
  2. 清水 荘雄. Ferroelectricity induced by the kinetic formation in Y-HfO2 epitaxial films. Materials Research Meeting 2021/https://mrm2021.jmru.org/. 2021
  3. 長谷川 浩太, 清水 荘雄, 大澤 健男, 坂口 勲, 大橋 直樹. 単結晶(Al,Sc)N薄膜の合成と強誘電体特性評価. 第41回電子材料研究討論会. 2021
  4. 清水 荘雄, 田代 裕貴, 三村 和仙, 白石 貴久, 木口 賢紀, 今野 豊彦, 坂田 修身, 舟窪 浩. Field-Induced Structural Change in HfO2-Based Ferroelectric Materials. The 2021 Fall Meeting of the European Materials Research Society. 2021 招待講演
  5. 清水 荘雄, 三村 和仙, 田代 裕貴, 坂田 修身, 舟窪 浩. Phase transition in HfO2 ferroelectric materials investigated by XRD study. The 2021 Spring Meeting of the European Materials Research Society. 2021 招待講演
  6. 清水 荘雄, 三村 和仙, 田代 裕貴, 木口 賢紀, 白石 貴久, 今野 豊彦, 坂田 修身, 舟窪 浩. Field-induced structural change in HfO2-based ferroelectric materials. ISAF-ISIS-PFM 2021 / https://isaf-isif-pfm2021.org/. 2021 招待講演
2020
  1. 清水 荘雄, 三村 和仙, 舟窪 浩. HfO2基強誘電体の相安定性と厚膜化. 第4回元素戦略シンポジウム. 2020

その他の文献 TSV

2020
  1. 三村 和仙, 志村 礼司郎, 舟窪 浩, 清水 荘雄. HfO2およびZrO2基強誘電体膜の厚膜化と室温合成. 超音波TECHNO. (2020) 41-45

公開特許出願 TSV

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