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Effects of deposition conditions on the ferroelectric properties of (Al1−xScx)N thin films

著者Shinnosuke Yasuoka, Takao Shimizu, Akinori Tateyama, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Yoshiomi Hiranaga, Yasuo Cho, Hiroshi Funakubo.
掲載誌名Journal of Applied Physics 128 [11] 114103
ISSN: 00218979, 10897550
ESIでのカテゴリ: PHYSICS
出版社AIP Publishing
発表年2020
言語English
DOIhttps://doi.org/10.1063/5.0015281
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