Systematic Investigation of Ferroelectric Properties in <i>x</i>%YO<sub>1.5</sub>–(100–<i>x</i>%)Hf<sub>1–<i>y</i></sub>Zr<sub><i>y</i></sub>O<sub>2</sub> Films | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Systematic Investigation of Ferroelectric Properties in x%YO1.5–(100–x%)Hf1–yZryO2 Films

Takanori Mimura, Yuki Tashiro, Takao Shimizu, Hiroshi Funakubo.

ACS Applied Electronic Materials 5 [3] 1600-1605. 2023.

https://doi.org/10.1021/acsaelm.2c01658

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清水荘雄

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2023-12-22 09:25:57 +0900更新時刻: 2024-04-02 07:26:37 +0900

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