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Effect of Film Microstructure on Domain Nucleation and Intrinsic Switching in Ferroelectric Y:HfO 2 Thin Film Capacitors

Pratyush Buragohain, Adam Erickson, Takanori Mimura, Takao Shimizu, Hiroshi Funakubo, Alexei Gruverman.
Advanced Functional Materials 32 [9] 2108876. 2022.

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    作成時刻: 2022-04-13 03:24:25 +0900更新時刻: 2024-03-31 16:29:22 +0900

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