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Effect of Film Microstructure on Domain Nucleation and Intrinsic Switching in Ferroelectric Y:HfO 2 Thin Film Capacitors

Pratyush Buragohain, Adam Erickson, Takanori Mimura, Takao Shimizu, Hiroshi Funakubo, Alexei Gruverman.
Advanced Functional Materials 32 [9] 2108876. 2022.
https://doi.org/10.1002/adfm.202108876

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    Created at: 2022-04-13 03:24:25 +0900 Updated at: 2026-10-30 08:12:42 +0900

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