Ferroelectricity mediated by ferroelastic domain switching in HfO2-based epitaxial thin films

著者	Takao Shimizu, Takanori Mimura, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo.
掲載誌名	Applied Physics Letters 113 [21] 212901 ISSN: 00036951, 10773118 ESIでのカテゴリ: PHYSICS
出版社	AIP Publishing
発表年	2018
言語	English
DOI	https://doi.org/10.1063/1.5055258
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