HOME > Article > DetailFerroelectricity mediated by ferroelastic domain switching in HfO2-based epitaxial thin filmsTakao Shimizu, Takanori Mimura, Takanori Kiguchi, Takahisa Shiraishi, Toyohiko Konno, Yoshio Katsuya, Osami Sakata, Hiroshi Funakubo. Applied Physics Letters 113 [21] 212901. 2018.https://doi.org/10.1063/1.5055258 NIMS author(s)SHIMIZU, TakaoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2019-03-01 11:29:41 +0900Updated at: 2024-05-01 04:59:01 +0900
