HOME > 論文 > 書誌詳細Comprehensive Study on the Kinetic Formation of the Orthorhombic Ferroelectric Phase in Epitaxial Y-Doped Ferroelectric HfO2 Thin FilmsYuki Tashiro, Takao Shimizu, Takanori Mimura, Hiroshi Funakubo. ACS Applied Electronic Materials 3 [7] 3123-3130. 2021.https://doi.org/10.1021/acsaelm.1c00342 NIMS著者清水 荘雄Materials Data Repository (MDR)上の本文・データセット作成時刻: 2021-11-16 03:37:33 +0900更新時刻: 2024-08-10 06:57:02 +0900
