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Comprehensive Study on the Kinetic Formation of the Orthorhombic Ferroelectric Phase in Epitaxial Y-Doped Ferroelectric HfO2 Thin Films

Yuki Tashiro, Takao Shimizu, Takanori Mimura, Hiroshi Funakubo.
ACS Applied Electronic Materials 3 [7] 3123-3130. 2021.
https://doi.org/10.1021/acsaelm.1c00342

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    Created at: 2021-11-16 03:37:33 +0900Updated at: 2024-09-12 05:43:28 +0900

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