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Preparation of 1 μm thick Y-doped HfO<sub>2</sub> ferroelectric films on (111)Pt/TiO <sub>x</sub> /SiO<sub>2</sub>/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties

著者Reijiro Shimura, Takanori Mimura, Akinori Tateyama, Takao Shimizu, Tomoaki Yamada, Yoshitomo Tanaka, Yukari Inoue, Hiroshi Funakubo.
掲載誌名Japanese Journal of Applied Physics 60 [3] 031009
ISSN: 13474065, 00214922
ESIでのカテゴリ: PHYSICS
出版社IOP Publishing
発表年2021
言語English
DOIhttps://doi.org/10.35848/1347-4065/abe72e
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