Preparation of 1 μm thick Y-doped HfO2 ferroelectric films on (111)Pt/TiO
x
/SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties
| 著者 | Reijiro Shimura, Takanori Mimura, Akinori Tateyama, Takao Shimizu, Tomoaki Yamada, Yoshitomo Tanaka, Yukari Inoue, Hiroshi Funakubo. |
|---|---|
| 掲載誌名 | Japanese Journal of Applied Physics 60 [3] 031009 ISSN: 13474065, 00214922 ESIでのカテゴリ: PHYSICS |
| 出版社 | IOP Publishing |
| 発表年 | 2021 |
| 言語 | English |
| DOI | https://doi.org/10.35848/1347-4065/abe72e |
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