Preparation of 1 μm thick Y-doped HfO2 ferroelectric films on (111)Pt/TiO
x
/SiO2/(001)Si substrates by a sputtering method and their ferroelectric and piezoelectric properties
| Author(s) | Reijiro Shimura, Takanori Mimura, Akinori Tateyama, Takao Shimizu, Tomoaki Yamada, Yoshitomo Tanaka, Yukari Inoue, Hiroshi Funakubo. |
|---|---|
| Journal title | Japanese Journal of Applied Physics 60 [3] 031009 ISSN: 13474065, 00214922 ESI category: PHYSICS |
| Publisher | IOP Publishing |
| Year of publication | 2021 |
| Language | English |
| DOI | https://doi.org/10.35848/1347-4065/abe72e |
| Import this reference to Mendeley |  |