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Impact of Deposition Temperature on Crystal Structure and Ferroelectric Properties of (Al 1− x Sc x )N Films Prepared by Sputtering Method

Shinnosuke Yasuoka, Takao Shimizu, Akinori Tateyama, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Hiroshi Funakubo.
physica status solidi (a) 218 [17] 2100302. 2021.

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    作成時刻: 2021-11-27 03:36:26 +0900更新時刻: 2024-07-03 06:20:24 +0900

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