Impact of Deposition Temperature on Crystal Structure and Ferroelectric Properties of (Al <sub> 1− <i>x</i> </sub> Sc <sub> <i>x</i> </sub> )N Films Prepared by Sputtering Method | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Impact of Deposition Temperature on Crystal Structure and Ferroelectric Properties of (Al 1− x Sc x )N Films Prepared by Sputtering Method

Shinnosuke Yasuoka, Takao Shimizu, Akinori Tateyama, Masato Uehara, Hiroshi Yamada, Morito Akiyama, Hiroshi Funakubo.

physica status solidi (a) 218 [17] 2100302. 2021.

https://doi.org/10.1002/pssa.202100302

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作成時刻: 2021-11-27 03:36:26 +0900更新時刻: 2024-03-31 11:49:44 +0900

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