| 43件の論文が見つかりました。論文は出版年月日順に表示しています。（ヘルプ） | |
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| Akihiro Ohtake, Takuya Kawazu, Takaaki Mano. Arsenic-flux dependence of surface morphology in InAs homoepitaxy. Journal of Vacuum Science & Technology A. 42 [6] (2024) 062702 10.1116/6.0003957 Open Access | |
| Fumikazu Mizutani, Makoto Mizui, Nobutaka Takahashi, Mari Inoue, Toshihide Nabatame. Atomic layer deposition of ZnO thin films using a liquid cyclopentadienyl-based precursor. Journal of Vacuum Science & Technology A. 42 [2] (2024) 022403 10.1116/6.0003178 | |
| Naoya Miyauchi, Taro Yakabe, Yoshiharu Murase, Masahiro Kitajima, Shoji Takagi, Akiko N. Itakura. Apparatus design of operando hydrogen microscope for visualization of time-dependent distribution of hydrogen. Journal of Vacuum Science & Technology A. 42 [1] (2024) 013201 10.1116/6.0003153 Open Access | |
| Zhuoqun Wen, Kamruzzaman Khan, Kai Sun, Ruby Wellen, Yuichi Oshima, Elaheh Ahmadi. Thermal stability of HVPE-grown (0001) α-Ga2O3 on sapphire template under vacuum and atmospheric environments. Journal of Vacuum Science & Technology A. 41 [4] (2023) 043403 10.1116/6.0002559 | |
| George H. Major, Joshua W. Pinder, Daniel E. Austin, Donald R. Baer, Steven L. Castle, Jan Čechal, B. Maxwell Clark, Hagai Cohen, Jonathan Counsell, Alberto Herrera-Gomez, Pavitra Govindan, Seong H. Kim, David J. Morgan, Robert L. Opila, Cedric J. Powell, Stanislav Průša, Adam Roberts, Mario Rocca, Naoto Shirahata, Tomáš Šikola, Emily F. Smith, Regina C. So, John E. Stovall, Jennifer Strunk, Andrew Teplyakov, Jeff Terry, Stephen G. Weber, Matthew R. Linford. Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS). Journal of Vacuum Science & Technology A. 41 [3] (2023) 038501 10.1116/6.0002437 | |
| Xinyi Xia, Jian-Sian Li, Zhuoqun Wen, Kamruzzaman Khan, Md Irfan Khan, Elaheh Ahmadi, Yuichi Oshima, David C. Hays, Fan Ren, S. J. Pearton. Type-II band alignment for atomic layer deposited HfSiO4 on α-Ga2O3. Journal of Vacuum Science & Technology A. 41 [2] (2023) 023205 10.1116/6.0002453 | |
| Erika Maeda, Toshihide Nabatame, Masafumi Hirose, Mari Inoue, Akihiko Ohi, Naoki Ikeda, Hajime Kiyono. Correlation between SiO2 growth rate and difference in electronegativity of metal–oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor. Journal of Vacuum Science & Technology A. 38 [3] (2020) 032409 10.1116/6.0000078 | |
| Mineharu Suzuki, Hiroko Nagao, Yoshitomo Harada, Hiroshi Shinotsuka, Katsumi Watanabe, Akito Sasaki, Asahiko Matsuda, Koji Kimoto, Hideki Yoshikawa. Raw-to-repository characterization data conversion for repeatable, replicable, and reproducible measurements. Journal of Vacuum Science & Technology A. 38 [2] (2020) 023204 10.1116/1.5128408 Open Access | |
| Fumikazu Mizutani, Shintaro Higashi, Mari Inoue, Toshihide Nabatame. Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma. Journal of Vacuum Science & Technology A. 38 [2] (2020) 022412 10.1116/1.5134738 | |
| Takashi Aizawa, Isao Ohkubo, Mariana S. L. Lima, Takeaki Sakurai, Takao Mori. Fabrication of Mg2Sn(111) film by molecular beam epitaxy. Journal of Vacuum Science & Technology A. 37 [6] (2019) 061513 10.1116/1.5122844 Open Access | |
