HOME > プロフィール > 池田 直樹
出版物2004年以降のNIMS所属における研究成果や出版物を表示しています。
論文
- Yuanzhao Yao, Naoki Ikeda, Siti Chalimah, Takashi Kuroda, Yoshimasa Sugimoto, Takaaki Mano, Hiromi Koyama, Rei Hashimoto, Kei Kaneko, Tsutomu Kakuno, Shinji Ookuma, Ryuichi Togawa, Hiroshi Ohno, Shinji Saito, Naoki Takahashi, Hirotaka Tanimura, Shigeyuki Takagi, Kazuaki Sakoda. Improved power and far-field pattern of surface-emitting quantum cascade lasers with strain compensation to operate at 4.3 μm. Japanese Journal of Applied Physics. 61 [5] (2022) 052001 10.35848/1347-4065/ac5dbb
- Xu Yang, Shisheng Li, Naoki Ikeda, Yoshiki Sakuma. Oxide Scale Sublimation Chemical Vapor Deposition for Controllable Growth of Monolayer MoS
<sub>2</sub>
Crystals. Small Methods. 6 [2] (2022) 2101107 10.1002/smtd.202101107
- Toshihide Nabatame, Erika Maeda, Mari Inoue, Masafumi Hirose, Yoshihiro Irokawa, Akihiko Ohi, Naoki Ikeda, Takashi Onaya, Koji Shiozaki, Ryota Ochi, Tamotsu Hashizume, Yasuo Koide. Influence of HfO<sub>2</sub> and SiO<sub>2</sub> interfacial layers on the characteristics of n-GaN/HfSiO<i><sub>x</sub></i> capacitors using plasma-enhanced atomic layer deposition. Journal of Vacuum Science & Technology A. 39 [6] (2021) 062405 10.1116/6.0001334
書籍
- SUGIMOTO, Yoshimasa, IKEDA, Naoki. プラズモニック・メタマテリアル作製のための微細加工技術. メタマテリアル II. , 2012, 230-239.
- IKEDA, Naoki, SUGIMOTO, Yoshimasa. 表面プラズモンを利用したフルカラーフィルタの開発. プラズモニクス−光・電子デバイス開発最前線. , 2011, 191-198.
- IKEDA, Naoki, SUGIMOTO, Yoshimasa. 表面プラズモン共鳴を使ったカラーフィルタ. プラズモン基礎理解の徹底と応用展開〜実用化への要求仕様と課題／解決策検討〜. , 2011, 235-245.
会議録
- Tomomi Sawada, Toshihide Nabatame, Takashi Onaya, Mari Inoue, Akihiko Ohi, Naoki Ikeda, Kazuhito Tsukagoshi. Importance of Annealing Step on Dielectric Constant of ZrO<sub>2</sub> Layer of MIM Capacitors with Al<sub>2</sub>O<sub>3</sub>/ZrO<sub>2</sub> and ZrO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> Stack Structures. ECS Transactions. 2021, 121-128
- Riku Kobayashi, Toshihide Nabatame, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Kazuhito Tsukagoshi, Atsushi Ogura. Characteristics of Oxide TFT Using Carbon-Doped Ιn2O3 Thin Film Fabricated by Low-Temperature ALD Using Ethylcyclopentadienyl Indium (Ιn-EtCp) and H2O & O3. ECS Transactions. 2019, 3-13
- Kazunori Kurishima, Toshihide Nabatame, Takashi Onaya, Kazuhito Tsukagoshi, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura. Suppression of threshold voltage shift on In-Si-O-C Thin-Film Transistor with an Al2O3 Passivation Layer under Negative and Positive Gate-Bias Stress. Electron Devices Technology and Manufacturing Conference (EDTM). 2019
口頭発表
- 楊 旭, 李 世勝, 池田 直樹, 佐久間 芳樹. Oxide Scale Sublimation Chemical Vapor Deposition: Controllable Growth of Monolayer MoS2. 2021 MRS Fall Meeting. 2021
- 澤田 朋実, 生田目 俊秀, 女屋 崇, 井上 万里, 大井 暁彦, 池田 直樹, 塚越 一仁. Importance of Annealing Step on Dielectric Constant of ZrO2 Layer of MIM Capacitors with Al2O3/ZrO2 and ZrO2/Al2O3 Stack Structures. 240th ECS Meeting / https://www.electrochem.org/240/. 2021
- 佐久間 芳樹, 楊 旭, 李 世勝, 池田 直樹. オキシクロライドCVDによるMoS2成膜過程へのO2添加効果. 第82回応用物理学会秋季学術講演会. 2021
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