HOME > Profile > IKEDA, Naoki
PublicationsNIMS affiliated publications since 2004.
Research papers
- Afshan Begum, Yuanzhao Yao, Takashi Kuroda, Eiichiro Watanabe, Naoki Ikeda, Yoshimasa Sugimoto, Yoshihiko Takeda, Kazuaki Sakoda. Observation of Two-dimensional Isotropic Double Dirac Cones in the Electromagnetic Dispersion Relation. Journal of the Physical Society of Japan. 91 [8] (2022) 10.7566/jpsj.91.084401
- Yuanzhao Yao, Naoki Ikeda, Siti Chalimah, Takashi Kuroda, Yoshimasa Sugimoto, Takaaki Mano, Hiromi Koyama, Rei Hashimoto, Kei Kaneko, Tsutomu Kakuno, Shinji Ookuma, Ryuichi Togawa, Hiroshi Ohno, Shinji Saito, Naoki Takahashi, Hirotaka Tanimura, Shigeyuki Takagi, Kazuaki Sakoda. Improved power and far-field pattern of surface-emitting quantum cascade lasers with strain compensation to operate at 4.3 μm. Japanese Journal of Applied Physics. 61 [5] (2022) 052001 10.35848/1347-4065/ac5dbb
- Xu Yang, Shisheng Li, Naoki Ikeda, Yoshiki Sakuma. Oxide Scale Sublimation Chemical Vapor Deposition for Controllable Growth of Monolayer MoS
2
Crystals. Small Methods. 6 [2] (2022) 2101107 10.1002/smtd.202101107
Proceedings
- Siti Chalimah, Yuanzhao Yao, Naoki Ikeda, Afshan Begum, Kei Kaneko, Rei Hashimoto, Tsutomu Kakuno, Shinji Saito, Takashi Kuroda, Yoshimasa Sugimoto, Kazuaki Sakoda. Mid-infrared angle-resolved spectral characteristics of photonic crystal slabs for application in surface-emitting quantum cascade lasers. JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS. 2022, 2250017-1-2250017-11
- Tomomi Sawada, Toshihide Nabatame, Takashi Onaya, Mari Inoue, Akihiko Ohi, Naoki Ikeda, Kazuhito Tsukagoshi. Importance of Annealing Step on Dielectric Constant of ZrO<sub>2</sub> Layer of MIM Capacitors with Al<sub>2</sub>O<sub>3</sub>/ZrO<sub>2</sub> and ZrO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> Stack Structures. ECS Transactions. 2021, 121-128
- Riku Kobayashi, Toshihide Nabatame, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Kazuhito Tsukagoshi, Atsushi Ogura. Characteristics of Oxide TFT Using Carbon-Doped Ιn2O3 Thin Film Fabricated by Low-Temperature ALD Using Ethylcyclopentadienyl Indium (Ιn-EtCp) and H2O & O3. ECS Transactions. 2019, 3-13
Presentations
- 楊 旭, 李 世勝, 池田 直樹, 佐久間 芳樹. Oxide Scale Sublimation Chemical Vapor Deposition: Controllable Growth of Monolayer MoS2. 2021 MRS Fall Meeting. 2021
- 澤田 朋実, 生田目 俊秀, 女屋 崇, 井上 万里, 大井 暁彦, 池田 直樹, 塚越 一仁. Importance of Annealing Step on Dielectric Constant of ZrO2 Layer of MIM Capacitors with Al2O3/ZrO2 and ZrO2/Al2O3 Stack Structures. 240th ECS Meeting / https://www.electrochem.org/240/. 2021
- 佐久間 芳樹, 楊 旭, 李 世勝, 池田 直樹. オキシクロライドCVDによるMoS2成膜過程へのO2添加効果. 第82回応用物理学会秋季学術講演会. 2021
