Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− <i>x</i> Zr <i>x</i> O2 thin films | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

HOME > 論文 > 書誌詳細

Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films

Haoming Che, Takashi Onaya, Atsushi Tamura, Masaki Ishii, Hiroshi Taka, Koji Kita.

Journal of Vacuum Science & Technology A 44 [3] 030402. 2026.

https://doi.org/10.1116/6.0005362

Open Access American Vacuum Society (Publisher) Materials Data Repository (MDR)

NIMS著者

女屋崇

Materials Data Repository (MDR)上の本文・データセット

MDRavailable Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− <i>x</i> Zr <i>x</i> O2 thin films

作成時刻: 2026-06-18 03:05:52 +0900 更新時刻: 2026-09-21 04:34:24 +0900

▲ページトップへ移動