Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− <i>x</i> Zr <i>x</i> O2 thin films | SAMURAI, NIMS Researchers Directory Service

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Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films

Haoming Che, Takashi Onaya, Atsushi Tamura, Masaki Ishii, Hiroshi Taka, Koji Kita.

Journal of Vacuum Science & Technology A 44 [3] 030402. 2026.

https://doi.org/10.1116/6.0005362

Open Access Materials Data Repository (MDR)

NIMS author(s)

ONAYA, Takashi

Fulltext and dataset(s) on Materials Data Repository (MDR)

MDRavailable Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− <i>x</i> Zr <i>x</i> O2 thin films

Created at: 2026-06-18 03:05:52 +0900 Updated at: 2026-10-22 04:34:52 +0900

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