- Address
- 305-0044 茨城県つくば市並木1-1 [アクセス]
- プロフィール
- タグクラウド
- 人のつながり
研究内容
出版物2004年以降のNIMS所属における研究成果や出版物を表示しています。
研究論文
- Thang Duy Dao, Chung Vu Hoang, Natsuki Nishio, Naoki Yamamoto, Akihiko Ohi, Toshihide Nabatame, Masakazu Aono, Tadaaki Nagao. Dark-Field Scattering and Local SERS Mapping from Plasmonic Aluminum Bowtie Antenna Array. Micromachines. 10 [7] (2019) 468 10.3390/mi10070468
- Anh Tung Doan, Takahiro Yokoyama, Thang Duy Dao, Satoshi Ishii, Akihiko Ohi, Toshihide Nabatame, Yoshiki Wada, Shigenao Maruyama, Tadaaki Nagao. A MEMS-Based Quad-Wavelength Hybrid Plasmonic–Pyroelectric Infrared Detector. Micromachines. 10 [6] (2019) 413 10.3390/mi10060413
- Thang Duy Dao, Anh Tung Doan, Satoshi Ishii, Takahiro Yokoyama, Handegård Sele Ørjan, Dang Hai Ngo, Tomoko Ohki, Akihiko Ohi, Yoshiki Wada, Chisato Niikura, Shinsuke Miyajima, Toshihide Nabatame, Tadaaki Nagao. MEMS-Based Wavelength-Selective Bolometers. Micromachines. 10 [6] (2019) 416 10.3390/mi10060416
会議録
- NABATAME, Toshihide, KIMURA, Masayuki, YAMADA, Hiroyuki, OHI, Akihiko, CHIKYOW, Toyohiro, Tomoji Ohishi. Mechanism of Vfb shift in HfO2 gate stack by Al diffusion from (TaC)1-xAlx gate electrode. ECS TRANSACTIONS. 2012, 49-59
- Toshihide Nabatame, Akihiko Ohi, Toyohiro Chikyow. Role of Hetero Interface of Ionic/Covalent Oxides for Pt/High-k/SiO. ECS TRANSACTIONS. 2010
- Kazunori Kurishima, Toshihide Nabatame, Takashi Onaya, Kazuhito Tsukagoshi, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura. Suppression of threshold voltage shift on In-Si-O-C Thin-Film Transistor with an Al2O3 Passivation Layer under Negative and Positive Gate-Bias Stress. Electron Devices Technology and Manufacturing Conference (EDTM). 2019
口頭発表
- ELAMIR, Ahmed Mohamed Elsayed Ahmed, OHSAWA, Takeo, WADA, Yoshiki, OHI, Akihiko, YAMAMOTO, Satoshi, SHIMAMURA, Kiyoshi, OHASHI, Naoki. Ecofriendly photodiode-based-Mg2Si for SWIR sensation. 日本セラミックス協会2018年年会. 2018
- NABATAME, Toshihide, OHI, Akihiko, Kazuhiro Ito, Makoto Takahashi, CHIKYOW, Toyohiro. Characteristics of charge trap flash memory with Al2O3/(Ta/Nb)Ox/Al2O3 multi-layer. 225th ECS Meeting. 2014
- NABATAME, Toshihide, OHI, Akihiko, CHIKYOW, Toyohiro, YAMADA, Hiroyuki, KIMURA, Masayuki, Tomoji Ohishi. High-k酸化膜の酸素拡散とフラットバンド電圧シフトの関係. 日本金属学会 2011年春期大会. 2011
第二期開発予定
第二期開発予定