HOME > プロフィール > 大井 暁彦
出版物2004年以降のNIMS所属における研究成果や出版物を表示しています。
論文
- Thang Duy Dao, Chung Vu Hoang, Natsuki Nishio, Naoki Yamamoto, Akihiko Ohi, Toshihide Nabatame, Masakazu Aono, Tadaaki Nagao. Dark-Field Scattering and Local SERS Mapping from Plasmonic Aluminum Bowtie Antenna Array. Micromachines. 10 [7] (2019) 468 10.3390/mi10070468
- Anh Tung Doan, Takahiro Yokoyama, Thang Duy Dao, Satoshi Ishii, Akihiko Ohi, Toshihide Nabatame, Yoshiki Wada, Shigenao Maruyama, Tadaaki Nagao. A MEMS-Based Quad-Wavelength Hybrid Plasmonic–Pyroelectric Infrared Detector. Micromachines. 10 [6] (2019) 413 10.3390/mi10060413
- Thang Duy Dao, Anh Tung Doan, Satoshi Ishii, Takahiro Yokoyama, Handegård Sele Ørjan, Dang Hai Ngo, Tomoko Ohki, Akihiko Ohi, Yoshiki Wada, Chisato Niikura, Shinsuke Miyajima, Toshihide Nabatame, Tadaaki Nagao. MEMS-Based Wavelength-Selective Bolometers. Micromachines. 10 [6] (2019) 416 10.3390/mi10060416
会議録
- Toshihide Nabatame, Ippei Yamamoto, Tomomi Sawada, Akihiko Ohi, Thang Duy Dao, Tomoji Ohishi, Tadaaki Nagao. Change of Electrical Properties of Rutile- and Anatase-TiO2 Films by Atomic Layer Deposited Al2O3. ECS Transactions. 2019, 15-21
- Riku Kobayashi, Toshihide Nabatame, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Kazuhito Tsukagoshi, Atsushi Ogura. Characteristics of Oxide TFT Using Carbon-Doped Ιn2O3 Thin Film Fabricated by Low-Temperature ALD Using Ethylcyclopentadienyl Indium (Ιn-EtCp) and H2O & O3. ECS Transactions. 2019, 3-13
- Kazunori Kurishima, Toshihide Nabatame, Takashi Onaya, Kazuhito Tsukagoshi, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura. Suppression of threshold voltage shift on In-Si-O-C Thin-Film Transistor with an Al2O3 Passivation Layer under Negative and Positive Gate-Bias Stress. Electron Devices Technology and Manufacturing Conference (EDTM). 2019
口頭発表
- ONAYA, Takashi, NABATAME, Toshihide, 澤本直美, OHI, Akihiko, 小椋厚志, NAGATA, Takahiro, IKEDA, Naoki. Effect of Ti Scavenging Layer on Ferroelectricity of HfxZr1−xO2 Thin Films Fabricated by Atomic Layer Deposition Using Hf/Zr Cocktail Precursor. AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) / https://ald2021.avs.org/. 2021
- ONAYA, Takashi, NABATAME, Toshihide, 澤本直美, OHI, Akihiko, IKEDA, Naoki, NAGATA, Takahiro, 小椋厚志. Control of ferroelectric phase formation in HfxZr1−xO2 thin films using nano-ZrO2 nucleation layer technique. MANA International Symposium 2021/https://www.nims.go.jp/mana/2021/index.html. 2021
- NABATAME, Toshihide, MAEDA, Erika, INOUE, Mari, HIROSE, Masafumi, KOBAYASHI, Riku, ONAYA, Takashi, OHI, Akihiko, IKEDA, Naoki, TSUKAGOSHI, Kazuhito. Study of SiO2 growth mechanism between a single SiO2 and (HfO2)/(SiO2) nanolaminate formation by ALD using TDMAS and H2O gas. 21st International Conference on Atomic Layer Deposition. 2021
▲ページトップへ移動
