- Address
- 305-0044 1-1 Namiki Tsukuba Ibaraki JAPAN [Access]
Research
PublicationsNIMS affiliated publications since 2004.
Research papers
- 大久保 勇男, 大井 暁彦, 相澤 俊, 森 孝雄, 村田正行. 微細化熱電デバイスの開発. クリーンエネルギー. 31 [11] (2022) 15-19
- Yoshihiro Irokawa, Akihiko Ohi, Toshihide Nabatame, Yasuo Koide. Pt/GaN Schottky Barrier Height Lowering by Incorporated Hydrogen. ECS Journal of Solid State Science and Technology. 13 [4] (2024) 045002 10.1149/2162-8777/ad3959 Open Access
- Isao Ohkubo, Masayuki Murata, Akihiko Ohi, Mariana S. L. Lima, Takeaki Sakurai, Takashi Aizawa, Takao Mori. Structural effects on the performance of microfabricated in-plane π -type thermoelectric devices composed of p-type Mg2Sn0.8Ge0.2 and n-type Bi layers. Applied Physics Letters. 122 [24] (2023) 243901 10.1063/5.0151494
Proceedings
- Kazunori Kurishima, Toshihide Nabatame, Takashi Onaya, Kazuhito Tsukagoshi, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura. Suppression of threshold voltage shift on In-Si-O-C Thin-Film Transistor with an Al2O3 Passivation Layer under Negative and Positive Gate-Bias Stress. Electron Devices Technology and Manufacturing Conference (EDTM). (2019) 10.1109/edtm.2019.8731167
- DAO, Duy Thang, CHEN, Kai, ISHII, Satoshi, OHI, Akihiko, NABATAME, Toshihide, KITAJIMA, Masahiro, NAGAO, Tadaaki. Aluminum Infrared Plasmonic Perfect Absorbers Fabricated by Colloidal Lithography. Proceedings of CLEO-PR 2015. (2015) 25E3_7-1-25E3_7-2
- NABATAME, Toshihide, KIMURA, Masayuki, YAMADA, Hiroyuki, OHI, Akihiko, CHIKYOW, Toyohiro, Tomoji Ohishi. Mechanism of Vfb shift in HfO2 gate stack by Al diffusion from (TaC)1-xAlx gate electrode. ECS TRANSACTIONS. (2012) 49-59
Presentations
- OHKUBO, Isao, 村田 正行, OHI, Akihiko, Mariana S.L. Lima, 櫻井 岳暁, AIZAWA, Takashi, MORI, Takao. Microfabricated in-plane π-type thermoelectric devices based on an epitaxial Mg2Sn0.8Ge0.2 thin film. The 39th Annual International Conference on Thermoelectrics (ICT 2023). 2023
- 大久保 勇男, 村田正行, 大井 暁彦, Mariana S. L. Lima, 櫻井岳暁, 相澤 俊, 森 孝雄. 微細加工技術を用いた薄膜型熱電デバイスの開発. 第70回 応用物理学会 春季学術講演会. 2023
- 澤田 朋実, 生田目 俊秀, 女屋 崇, 井上 万里, 大井 暁彦, 池田 直樹, 塚越 一仁. Importance of Annealing Step on Dielectric Constant of ZrO2 Layer of MIM Capacitors with Al2O3/ZrO2 and ZrO2/Al2O3 Stack Structures. 240th ECS Meeting / https://www.electrochem.org/240/. 2021
Misc
- 大久保 勇男, 大井 暁彦, 相澤 俊, 森 孝雄, 村田正行. 微細加工技術を用いた平面π型熱電デバイスの開発. 日本熱電学会誌. 19 [3] (2023) 139(11)
- DAO, Duy Thang, CHEN, Kai, ISHII, Satoshi, OHI, Akihiko, NABATAME, Toshihide, KITAJIMA, Masahiro, NAGAO, Tadaaki. Aluminum Infrared Plasmonic Perfect Absorbers Fabricated by Colloidal Lithography. Proceedings of CLEO-PR 2015. (2015) 25E3_7-1-25E3_7-2
Published patent applications
- 第１の細線と第２の細線の間隔が５ｎｍ以上２０μｍ未満である乾湿応答センサー (2017)
- 半導体装置、半導体装置の使用方法およびその半導体装置の製造方法 (2020)
- 乾湿応答センサー (2020)
この機能は所内限定です。
この機能は所内限定です。