| 19件の論文が見つかりました。論文は出版年月日順に表示しています。（ヘルプ） | |
|---|
| A Pierret, D Mele, H Graef, J Palomo, T Taniguchi, K Watanabe, Y Li, B Toury, C Journet, P Steyer, V Garnier, A Loiseau, J-M Berroir, E Bocquillon, G Fève, C Voisin, E Baudin, M Rosticher, B Plaçais. Dielectric permittivity, conductivity and breakdown field of hexagonal boron nitride. Materials Research Express. 9 [6] (2022) 065901 10.1088/2053-1591/ac4fe1 | |
| Fahim Ahmed, Jaroslav Valenta, Naohito Tsujii, Ahmad Hussain, Nawishta Jabeen, Takao Mori. The low and high temperature thermoelectric properties of Yb3Si5. Materials Research Express. 8 [7] (2021) 075504 10.1088/2053-1591/ac128a | |
| Ryo Toyama, Shiro Kawachi, Soshi Iimura, Jun-ichi Yamaura, Youichi Murakami, Hideo Hosono, Yutaka Majima. Formation of L10-ordered CoPt during interdiffusion of electron-beam-deposited Pt/Co bilayer thin films on Si/SiO2 substrates by rapid thermal annealing. Materials Research Express. 7 [6] (2020) 066101 10.1088/2053-1591/ab934a | |
| Hiroshi Hara, Shintaro Adachi, Ryo Matsumoto, Yoshito Saito, Sayaka Yamamoto, Hiroyuki Takeya, Yoshihiko Takano. Rapid crystal growth of triple-layered cuprate superconductor HgBa2Ca2Cu3O8+δ by cesium chloride additional method. Materials Research Express. 7 [8] (2020) 086002 10.1088/2053-1591/aba6c0 | |
| Takumu Iwanaka, Toshiaki Kusunoki, Hiroshi Kotaki, Motomune Kodama, Hideki Tanaka, Akiyoshi Matsumoto, Shigeru Horii, Toshiya Doi. New deposition method of MgB2 thin film with thermal evaporation of Mg and sputtering of B. Materials Research Express. 7 [5] (2020) 056003 10.1088/2053-1591/ab945a | |
| T Naka, J Valenta, J Kaštil, M Míšek, J Prchal, V Sechovský, H Abe, T Nakane, M Nakayama, T Uchikoshi. Chemical and physical pressure effects in the A-site spinel antiferromagnets CoM2O4 (M = Al, Co, and Rh). Materials Research Express. 7 [5] (2020) 056105 10.1088/2053-1591/ab924f | |
| M Kamalnath, B Mohan, Alok Singh, K Thirumavalavan. Development of Al1070-Quasicrystal (Al65Cu23Fe12) composites using friction stir processing and its mechanical characterization. Materials Research Express. 7 [2] (2020) 026535 10.1088/2053-1591/ab71c5 | |
| I O Kruhlov, I A Vladymyrskyi, O Dubikovskyi, S I Sidorenko, T Ebisu, K Kato, O Sakata, T Ishikawa, Y Iguchi, G A Langer, Z Erdélyi, S M Voloshko. Oxidation and reduction processes in Ni/Cu/Cr/Si(100) thin films under low-energy ion irradiation. Materials Research Express. 6 [12] (2019) 126431 10.1088/2053-1591/ab6382 | |
| Ippei Suzuki, Jun Uzuhashi, Tadakatsu Ohkubo, Shinji Isogami. Strain relaxation in epitaxial γ′-Fe4N ultrathin films. Materials Research Express. 6 [10] (2019) 106446 10.1088/2053-1591/ab41b9 | |
| Ha Hoang, Tatsuki Hori, To-oru Yasuda, Takio Kizu, Kazuhito Tsukagoshi, Toshihide Nabatame, Bui Nguyen Quoc Trinh, Akihiko Fujiwara. Si-doping effect on solution-processed In-O thin-film transistors. Materials Research Express. 6 [2] (2019) 026410 10.1088/2053-1591/aaecf9 | |
