| 49734件の論文が見つかりました。論文は出版年月日順に表示しています。（ヘルプ） | |
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| Oleksiy, STARYKOV, SAKURAI, Kenji. Determination of interface roughness of Gd films deposited on Si surface using improved wavelet transform of X-ray reflectivity . APPLIED SURFACE SCIENCE. (2005) 235-239 | |
| HASEGAWA, Akira, MITSUISHI, Kazutaka, FURUYA, Kazuo, C. W. アレン, R. C. バーチャ, S. E. ドナリ. Structure variation of nanometer-sized Xe particles embedded in Al crystals. APPLIED SURFACE SCIENCE. (2005) 96-101 | |
| YAMAURA, Kazunari, Young DP, MUROMACHI, Eiji. Magnetic studies of the lightly Ru doped perovskite rtodates Sr(Ru, Rh)O3. PHYSICA B-CONDENSED MATTER. (2005) 1261-1263 | |
| HASEGAWA, Akira, MITSUISHI, Kazutaka, TAKEGUCHI, Masaki, FURUYA, Kazuo. Characterization of nanometer-sized dendritic form structures fabricated on insulator substrates with an electron-beam-induced d. APPLIED SURFACE SCIENCE. (2005) 107-112 | |
| JU, Xin, KURAHASHI, Mitsunori, SUZUKI, Taku, YAMAUCHI, Yasushi. fabrication of gold patterns with nanoscale edge by using heptanethiol self-assembled monolayer and metastable helium beam. APPLIED SURFACE SCIENCE. (2005) 241-245 | |
| KITAGUCHI, Hitoshi, 木村諭, 下之園勉, 花井哲, TAKEUCHI, Takao, INOUE, Kiyoshi. Critical Currents of Nb3Sn Wire Subject to Applied Transverse Stress. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY. (2005) 3454-3457 | |
| SAKUMA, Yoshiki, 竹本一矢, 廣瀬真一, 臼杵達哉, 横山直樹. Controlling Emission Wavelength from InAs Self-Assembled Quantum Dots on InP(001) during MOCVD. PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES. (2005) 81-85 | |
| 竹本一矢, SAKUMA, Yoshiki, 廣瀬真一, 臼杵達哉, 横山直樹, 宮澤俊之, 高津求, 荒川泰彦. Single InAs/InP Quantum Dot Spectroscopy in 1.3-1.55μm Telecommunication Band. PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES. (2005) 185-189 | |
| YAMAUCHI, Yasushi, 野呂武司, KURAHASHI, Mitsunori, SUZUKI, Taku, JU, Xin. Metastable-atom-stimulated Desorption from Dodecanethiolate Self-assembled Monolayer. APPLIED SURFACE SCIENCE. (2005) 141-145 | |
| SUZUKI, Hiroshi, ARAKI, Hiroshi, YANG, WEN, NODA, Tetsuji. Formation of Isotope Controlled SiC Thin Film by Plasma Chemical Vapor Deposition and its Characterization. APPLIED SURFACE SCIENCE. (2005) 266-269 10.1016/j.apsusc.2004.09.043 | |
