HOME > 論文 > 書誌詳細Formation of Isotope Controlled SiC Thin Film by Plasma Chemical Vapor Deposition and its CharacterizationSUZUKI, Hiroshi, ARAKI, Hiroshi, YANG, WEN, NODA, Tetsuji. APPLIED SURFACE SCIENCE 266-269. 2005.https://doi.org/10.1016/j.apsusc.2004.09.043 NIMS著者鈴木 裕Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-10-21 22:01:58 +0900更新時刻: 2024-04-01 23:15:11 +0900
