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機構に所属する研究者の発表した論文を、タイトル・抄録・分野などから検索することができます。論文の分野はクラリベイト社のESI分類を参考に分類しています(Materials Science, Physics, Chemistry, Engineering, Biologyなど)。

最終更新日: 2024年06月23日

  • Takeshi Iyasu, Keiji Tamura, Ryuichi Shimizu, Zengming Zhang, Takanori Koshikawa, Hideki Yoshikawa, Sei Fukushima. Monte-Carlo simulation of secondary electron emission by x-ray irradiation - an application of x-ray absorption near-edge structure (XANES). Surface and Interface Analysis. 36 [10] (2004) 1413-1416 10.1002/sia.1932
  • M. P. Seah, S. J. Spencer, F. Bensebaa, I. Vickridge, H. Danzebrink, M. Krumrey, T. Gross, W. Oesterle, E. Wendler, B. Rheinländer, Y. Azuma, I. Kojima, N. Suzuki, M. Suzuki, S. Tanuma, D. W. Moon, H. J. Lee, Hyun Mo Cho, H. Y. Chen, A. T. S. Wee, T. Osipowicz, J. S. Pan, W. A. Jordaan, R. Hauert, U. Klotz, C. van der Marel, M. Verheijen, Y. Tamminga, C. Jeynes, P. Bailey, S. Biswas, U. Falke, N. V. Nguyen, D. Chandler-Horowitz, J. R. Ehrstein, D. Muller, J. A. Dura. Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V: Results of a CCQM pilot study. Surface and Interface Analysis. 36 [9] (2004) 1269-1303 10.1002/sia.1909
  • Isao Sakaguchi, Syunichi Hishita. Quantitative analyses of impurities in ZnO. Surface and Interface Analysis. 36 [7] (2004) 645-648 10.1002/sia.1904
  • Shinjiro Yagyu, Michiko Yoshitake. Distinguishing the dependence of the apparent local barrier on measurement conditions. Surface and Interface Analysis. 36 [8] (2004) 1110-1113 10.1002/sia.1852
  • Michiko Yoshitake, Shinjiro Yagyu. The effect of bias voltage on the measurement of local barrier height. Surface and Interface Analysis. 36 [8] (2004) 1106-1109 10.1002/sia.1851
  • Weijie Song, Michiko Yoshitake, Thi Thi Lay. X-ray photoelectron spectroscopic analysisi of growth and thermal stability of palladium ultra thin films on alumina/NiAl(110). Surface and Interface Analysis. 36 [8] (2004) 1136-1139 10.1002/sia.1859
  • Michiko Yoshitake, Yasuhiro Yamauchi, Chandra Bose. Sputtering rate measurements of some transition metal silicides and comparison with those of the elements. Surface and Interface Analysis. 36 [8] (2004) 801-804 10.1002/sia.1768
  • T. Oishi, M. Goto, A. Kasahara, M. Tosa. Low frictional copper oxide film prepared with sodium hydroxide solution. Surface and Interface Analysis. 36 [8] (2004) 1259-1261 10.1002/sia.1889
  • TANUMA, Shigeo. Calculations of electron inelastic mean free paths (IMFPs) VII. Reliability of the TPP-2M predictice equation. SURFACE AND INTERFACE ANALYSIS. (2003) 268-275
  • M. Yoshitake, S. Bera, Y. Yamauchi. AES and LEED study of well-ordered oxide film grown on Cu-9at%Al(111). Surface and Interface Analysis. 35 [10] (2003) 824-828 10.1002/sia.1610
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