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酸化物薄膜トランジスターに対する信頼性へのAl2O3/In0.76Si0.24O0.99C0.01界面の影響
(Influence of Al2O3/In0.76Si0.24O0.99C0.01 interface on reliability for oxide thin film transistor)

PCSI-45. January 14, 2018-January 18, 2018.

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Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2017-10-03 22:11:58 +0900Updated at: 2018-06-05 14:13:31 +0900

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