HOME > 論文 > 書誌詳細Electrical hysteresis in p-GaN metal–oxide–semiconductor capacitor with atomic-layer-deposited Al2O3as gate dielectric(Electrical hysteresis in p-GaN metal–oxide–semiconductor capacitor with atomic-layer-deposited Al2O3 as gate dielectric)Kexiong Zhang, Meiyong Liao, Masataka Imura, Toshihide Nabatame, Akihiko Ohi, Masatomo Sumiya, Yasuo Koide, Liwen Sang. Applied Physics Express 9 [12] 121002. 2016.https://doi.org/10.7567/apex.9.121002 NIMS著者廖 梅勇井村 将隆生田目 俊秀大井 暁彦角谷 正友小出 康夫Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-11-30 23:51:15 +0900更新時刻: 2024-09-08 04:37:02 +0900