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Electrical hysteresis in p-GaN metal–oxide–semiconductor capacitor with atomic-layer-deposited Al2O3as gate dielectric
(Electrical hysteresis in p-GaN metal–oxide–semiconductor capacitor with atomic-layer-deposited Al2O3 as gate dielectric)

Applied Physics Express 9 [12] 121002. 2016.

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    作成時刻: 2016-11-30 23:51:15 +0900更新時刻: 2024-04-01 21:52:55 +0900

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