SAMURAI - NIMS Researchers Database

HOME > Article > Detail

Electrical hysteresis in p-GaN metal–oxide–semiconductor capacitor with atomic-layer-deposited Al2O3as gate dielectric
(Electrical hysteresis in p-GaN metal–oxide–semiconductor capacitor with atomic-layer-deposited Al2O3 as gate dielectric)

Applied Physics Express 9 [12] 121002. 2016.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2016-11-30 23:51:15 +0900Updated at: 2024-04-01 21:52:55 +0900

    ▲ Go to the top of this page