Characteristics of Oxide TFT Using Carbon-Doped Ιn2O3 Thin Film Fabricated by Low-Temperature ALD Using Ethylcyclopentadienyl Indium (Ιn-EtCp) and H2O & O3

著者	Riku Kobayashi, Toshihide Nabatame, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Kazuhito Tsukagoshi, Atsushi Ogura.
掲載誌名	ECS Transactions 92 [3] 3-13 ISSN: 19386737
出版社	The Electrochemical Society
発表年	2019
言語	English
DOI	https://doi.org/10.1149/09203.0003ecst
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