SAMURAI - NIMS Researchers Database

HOME > Article > Detail

Influence of post-deposition annealing on characteristics of Pt/Al2O3/β-Ga2O3 MOS capacitors

Microelectronic Engineering 216 111040. 2019.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at :2019-10-01 03:00:54 +0900 Updated at :2020-11-16 22:11:56 +0900

    ▲ Go to the top of this page