HOME > Presentation > Detail(COMBINATORIAL MATERIALS EXPLORATION ON HIGH-K GATE OXIDE AND METAL GATE FOR FUTURE CMOS DEVICES)知京 豊裕, 大井 暁彦, 生田目 俊秀, 長田 貴弘, 吉武 道子, 陳 君, 関口 隆史, 大毛利 健治. ISAEM-2012 -AMDI-3. 2012. InvitedNIMS author(s)CHIKYO, ToyohiroOHI, AkihikoNABATAME, ToshihideNAGATA, TakahiroYOSHITAKE, MichikoCHEN, JunFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 05:34:42 +0900Updated at: 2024-03-05 11:44:15 +0900