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著者名NAGATA, Takahiro, YAMASHITA, Yoshiyuki, YOSHIKAWA, Hideki, IMURA, Masataka, OH, Seungjun, KOBASHI, Kazuyoshi, CHIKYOW, Toyohiro.
タイトルBias induced Cu ion migration behavior in resistive change memory structure observed by hard x-ray photoelectron spectroscopy
会議名2014 International Microprocesses and Nanotechnology Conference
発表年2014
言語English
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