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Study of SiO2 growth mechanism between a single SiO2 and (HfO2)/(SiO2) nanolaminate formation by ALD using TDMAS and H2O gas
21st International Conference on Atomic Layer Deposition. June 27, 2021-June 30, 2021.
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Created at: 2021-09-18 03:00:21 +0900 Updated at: 2021-09-18 03:00:21 +0900