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Influence of Adsorbed O2 on The Gate-Bias Stress Stability of Back-Gate-Type TFT with Carbon-Doped In2O3 Channel

著者KOBAYASHI, Riku, NABATAME, Toshihide, ONAYA, Takashi, OHI, Akihiko, IKEDA, Naoki, NAGATA, Takahiro, TSUKAGOSHI, Kazuhito, 小椋 厚志.
会議名33rd International Microprocesses and Nanotechnology Conference/https://mnc2020.award-con.com/LOGIN.php
発表年2020
言語English

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