Influence of Adsorbed O2 on The Gate-Bias Stress Stability of Back-Gate-Type TFT with Carbon-Doped In2O3 Channel
著者 | KOBAYASHI, Riku, NABATAME, Toshihide, ONAYA, Takashi, OHI, Akihiko, IKEDA, Naoki, NAGATA, Takahiro, TSUKAGOSHI, Kazuhito, 小椋 厚志. |
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会議名 | 33rd International Microprocesses and Nanotechnology Conference/https://mnc2020.award-con.com/LOGIN.php |
発表年 | 2020 |
言語 | English |