Influence of Adsorbed O2 on The Gate-Bias Stress Stability of Back-Gate-Type TFT with Carbon-Doped In2O3 Channel
| 著者 | KOBAYASHI, Riku, NABATAME, Toshihide, ONAYA, Takashi, OHI, Akihiko, IKEDA, Naoki, NAGATA, Takahiro, TSUKAGOSHI, Kazuhito, 小椋 厚志. |
|---|---|
| 会議名 | 33rd International Microprocesses and Nanotechnology Conference/https://mnc2020.award-con.com/LOGIN.php |
| 発表年 | 2020 |
| 言語 | English |