| 60 article(s) found. Sorted by publication dates. (Help) | |
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| Miyoko Tanaka, Atsushi Teraoka, Masayuki Shimojo. Magic Cluster Arrays of In and In/Ag Compound on Si(111)-7×7 studied by UHV-TEM / STM. Surface and Interface Analysis. 42 [10-11] (2010) 1520-1523 10.1002/sia.3579 | |
| Slavomir Nemsak, Tomas Skala, Michiko Yoshitake, Nataliya Tsud, Taeyoung Kim, Shinjiro Yagyu, Vladimir Matolin. Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study. Surface and Interface Analysis. 42 [10-11] (2010) 1581-1584 10.1002/sia.3582 | |
| Taeyoung Kim, Michiko Yoshitake, Shinjiro Yagyu, Slavomir Nemsak, Takahiro Nagata, Toyohiro Chikyow. XPS study on band alignment at PtO-terminated ZnO(0001) interface. Surface and Interface Analysis. 42 [10-11] (2010) 1528-1531 10.1002/sia.3601 | |
| Mitsuhiro Okuda, Masaki Takeguchi, Yufang Zhu, Ayako Hashimoto, Nobuhiro Ogawa, Motohiro Tagaya, Song Chen, Nobutaka Hanagata, Toshiyuki Ikoma. Structural analysis of rattle-type hollow mesoporous silica spheres using electron tomography and energy filtered imaging. Surface and Interface Analysis. 42 [10-11] (2010) 1548-1551 10.1002/sia.3572 | |
| M. Yoshitake, K. Ohmori, T. Chikyow. Interface characterization of a metal-oxide-semiconductor structure by biased X-ray photoelectron spectroscopy. Surface and Interface Analysis. 42 [2] (2010) 70-76 10.1002/sia.3154 | |
| Takashi Doi, Kazuyuki Kitamura, Yoshitaka Nishiyama, Nobuo Otsuka, Takeo Kudo, Masugu Sato, Eiji Ikenaga, Shigenori Ueda, Keisuke Kobayashi. Analysis of Cu segregation to oxide-metal interface of Ni-based alloy in a metal-dusting environment. Surface and Interface Analysis. 40 [10] (2008) 1374-1381 10.1002/sia.2910 | |
| Mineharu Suzuki, Sei Fukushima, Shigeo Tanuma. Efficiency of Visual Peak Detection in X-ray Photoelectron Spectra. Surface and Interface Analysis. 40 [10] (2008) 1337-1343 10.1002/sia.2894 | |
| Y. Suzuki, Y. Sumi, K. Kita, T. Miyanaga, K. Sagisaka. Influence of local structure on local electric field in island-like silver films. Surface and Interface Analysis. 38 [9] (2006) 1296-1301 10.1002/sia.2443 | |
| A. Jablonski, S. Tanuma, C. J. Powell. New universal expression for the electron stopping power for energies between 200 eV and 30 keV. Surface and Interface Analysis. 38 [2] (2006) 76-83 10.1002/sia.2202 | |
| S. Tanuma. Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 - Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy. Surface and Interface Analysis. 38 [3] (2006) 178-180 10.1002/sia.2177 Open Access | |
