HOME > 論文 > 書誌詳細Interface characterization of a metal-oxide-semiconductor structure by biased X-ray photoelectron spectroscopyM. Yoshitake, K. Ohmori, T. Chikyow. Surface and Interface Analysis 42 [2] 70-76. 2010.https://doi.org/10.1002/sia.3154 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 16:01:32 +0900更新時刻: 2024-03-31 18:01:08 +0900
