HOME > 論文 > 書誌詳細Ferroelectricity of HfxZr1−xO2 Thin Films Fabricated Using TiN Stressor and ZrO2 Nucleation TechniquesTakashi Onaya, Toshihide Nabatame, Naomi Sawamoto, Kazunori Kurishima, Akihiko Ohi, Naoki Ikeda, Takahiro Nagata, Atsushi Ogura. ECS Transactions 86 [6] 31-38. 2018.https://doi.org/10.1149/08606.0031ecst NIMS著者生田目 俊秀大井 暁彦池田 直樹長田 貴弘Materials Data Repository (MDR)上の本文・データセット作成時刻: 2019-03-01 11:36:50 +0900更新時刻: 2024-03-31 10:33:42 +0900
