(Combination with Atomic Layer Deposition Technique for Fabrication of High-performance HfO2/diamond Metal-oxide-insulator Field Effect Transistors)
2013 NIMS conference. 2013.
NIMS著者
Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2017-01-08 03:55:01 +0900更新時刻: 2017-07-10 21:40:11 +0900