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(Combination with Atomic Layer Deposition Technique for Fabrication of High-performance HfO2/diamond Metal-oxide-insulator Field Effect Transistors)
2013 NIMS conference. July 01, 2013-July 03, 2013.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 03:55:01 +0900Updated at: 2017-07-10 21:40:11 +0900