HOME > Presentation > DetailナノZrO2核生成層を用いた強誘電体HfxZr1−xO2薄膜の作製技術(Fabrication technique of ferroelectric HfxZr1−xO2 thin films using nano-ZrO2 nucleation layer)女屋 崇, 生田目 俊秀, 澤本直美, 大井 暁彦, 池田 直樹, 長田 貴弘, 小椋厚志. 第79回応用物理学会秋季学術講演会. September 18, 2018-September 21, 2018. InvitedNIMS author(s)NABATAME, ToshihideOHI, AkihikoIKEDA, NaokiNAGATA, TakahiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2018-07-01 16:43:10 +0900Updated at: 2024-03-05 12:20:41 +0900