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ALD-ZrO2シード層によるHfxZr1-xO2膜の強誘電性の改良
(Improvement of ferroelectricity of HfxZr1-xO2 film using ALD-ZrO2 seed layer)
第64回応用物理学会春季学術講演会. March 14, 2017-March 17, 2017.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-19 04:38:52 +0900Updated at: 2017-07-10 22:35:13 +0900