HOME > Presentation > DetailHole channel formation mechanism in AlN/diamond heterojunction and high-k oxide gate diamond FETs小出 康夫, 井村 将隆, 劉 江偉, 廖 梅勇, バナル ガニパン ライアン, 松元隆夫, 柴田直哉, 幾原雄一. ICDCM 2015. September 06, 2015-September 12, 2015.NIMS author(s)KOIDE, YasuoIMURA, MasatakaLIU, JiangweiLIAO, MeiyongFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:11:53 +0900Updated at: 2017-07-10 22:14:15 +0900