HOME > Presentation > Detail(Oxygen migration at Pt or Cu/HfO2 interface under bias operation: oxide based ReRAM application)長田 貴弘, 南風盛 将光, 山下 良之, 吉川 英樹, 小林 啓介, 岩下 祐太, 知京 豊裕. 2011 Materials Research Society Spring Meeting and Exhibit. April 25, 2011-April 29, 2011.NIMS author(s)NAGATA, TakahiroYAMASHITA, YoshiyukiYOSHIKAWA, HidekiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:00:26 +0900 Updated at: 2017-07-10 21:03:54 +0900