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著者名NAGATA, Takahiro, HAEMORI, Masamitsu, YAMASHITA, Yoshiyuki, YOSHIKAWA, Hideki, KOBAYASHI, Keisuke, IWASHITA, Yuta, CHIKYOW, Toyohiro.
タイトルOxygen migration at Pt or Cu/HfO2 interface under bias operation: oxide based ReRAM application
会議名2011 Materials Research Society Spring Meeting and Exhibit
発表年2011
言語English
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