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AuthorNAGATA, Takahiro, HAEMORI, Masamitsu, YAMASHITA, Yoshiyuki, YOSHIKAWA, Hideki, KOBAYASHI, Keisuke, IWASHITA, Yuta, CHIKYOW, Toyohiro.
TitleOxygen migration at Pt or Cu/HfO2 interface under bias operation: oxide based ReRAM application
Event name2011 Materials Research Society Spring Meeting and Exhibit
Year of publication2011
LanguageEnglish
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