HOME > Presentation > Detail(Oxygen migration at Pt or Cu/HfO2 interface under bias operation: oxide based ReRAM application)長田 貴弘, 南風盛 将光, 山下 良之, 吉川 英樹, 小林 啓介, 岩下 祐太, 知京 豊裕. 2011 Materials Research Society Spring Meeting and Exhibit. 2011.NIMS author(s)NAGATA, TakahiroYAMASHITA, YoshiyukiYOSHIKAWA, HidekiCHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:00:26 +0900Updated at: 2017-07-10 21:03:54 +0900