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HfO2/Ge界面へのルチル型TiO2挿入によるGeOx生成の抑制
(Suppression of GeOx with rutile TiO2 Interlayer between HfO2 and Ge)

シリコン材料・デバイス研究会 (SDM). 2013.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at :2017-02-14 10:53:31 +0900 Updated at :2017-07-10 21:39:00 +0900

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