HOME > Presentation > Detail
Influence of post-deposition annealing on electrical characteristics of Pt/Al2O3/β-Ga2O3 MOS capacitors
HIROSE, Masafumi,
NABATAME, Toshihide,
YUGE, Kazuya,
MAEDA, Erika,
OHI, Akihiko,
IKEDA, Naoki,
IROKAWA, Yoshihiro,
IWAI, Hideo, 安福 秀幸,
KAWADA, Satoshi,
KOIDE, Yasuo.
INFOS 2019. 2019.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2019-10-05 03:00:21 +0900Updated at: 2019-10-05 03:00:21 +0900