Effect of ZrO2 capping-layer on ferroelectricity of HfxZr1−xO2 thin films by ALD using Hf/Zr cocktail precursor
18th International Conference on Atomic Layer Deposition. 2018.
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Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2018-03-07 22:39:59 +0900更新時刻: 2018-06-05 14:18:40 +0900