Improvement in ferroelectricity of Hf x Zr1− x O2 thin films using ZrO2 seed layer
(Improvement in ferroelectricity of HfxZr1-xO2 thin film using ZrO2 seed layer)

著者	Takashi Onaya, Toshihide Nabatame, Naomi Sawamoto, Akihiko Ohi, Naoki Ikeda, Toyohiro Chikyow, Atsushi Ogura.
掲載誌名	Applied Physics Express 10 [8] 081501 ISSN: 18820786, 09538984, 18820778 ESIでのカテゴリ: PHYSICS
出版社	Japan Society of Applied Physics
発表年	2017
言語	English
DOI	https://doi.org/10.7567/apex.10.081501
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