極低角度入射ビームオージェ深さ方向分析によるHfO2/Si基板の分析
(Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam)
JOURNAL OF SURFACE ANALYSIS 24 [3] 192-205. 2018.
NIMS著者
Materials Data Repository (MDR)上の本文・データセット
- MDRavailable Raw data files for Fig. 9 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- MDRavailable Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam
- MDRavailable Raw data files for Fig. 11 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- MDRavailable Raw data files for Fig. 5 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- MDRavailable Raw data files for Fig. 12 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- MDRavailable Raw data files for Fig. 7 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- MDRavailable Raw data files for Fig. 10 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- MDRavailable Raw data files for Fig. 8 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
- MDRavailable Raw data files for Fig. 6 Auger depth profiles in "Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam"
作成時刻: 2018-06-05 20:55:51 +0900更新時刻: 2024-03-31 00:35:41 +0900