極低角度入射ビームオージェ深さ方向分析によるHfO2/Si基板の分析
(Auger Depth Profiling Analysis of HfO2/Si Specimen Using an Ultra Low Angle Incidence Ion Beam)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2018-06-05 20:55:51 +0900Updated at: 2024-05-01 04:38:39 +0900