HOME > 論文 > 書誌詳細Change of Electrical Properties of Rutile- and Anatase-TiO2 Films by Atomic Layer Deposited Al2O3(Change of Electrical Properties of Rutile- and Anatase-TiO2 Films By Atomic Layer Deposited Al2O3)Toshihide Nabatame, Ippei Yamamoto, Tomomi Sawada, Akihiko Ohi, Thang Duy Dao, Tomoji Ohishi, Tadaaki Nagao. ECS Transactions 92 [3] 15-21. 2019.https://doi.org/10.1149/09203.0015ecst NIMS著者生田目 俊秀大井 暁彦長尾 忠昭Materials Data Repository (MDR)上の本文・データセット作成時刻 :2019-10-22 03:04:18 +0900 更新時刻 :2019-12-02 18:21:35 +0900