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Change of Electrical Properties of Rutile- and Anatase-TiO2 Films by Atomic Layer Deposited Al2O3
(Change of Electrical Properties of Rutile- and Anatase-TiO2 Films By Atomic Layer Deposited Al2O3)

Toshihide Nabatame, Ippei Yamamoto, Tomomi Sawada, Akihiko Ohi, Thang Duy Dao, Tomoji Ohishi, Tadaaki Nagao.
ECS Transactions 92 [3] 15-21. 2019.
https://doi.org/10.1149/09203.0015ecst

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    Created at: 2019-10-22 03:04:18 +0900Updated at: 2024-03-30 23:57:52 +0900

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