Change of Electrical Properties of Rutile- and Anatase-TiO2 Films by Atomic Layer Deposited Al2O3 | SAMURAI, NIMS Researchers Directory Service

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Change of Electrical Properties of Rutile- and Anatase-TiO2 Films by Atomic Layer Deposited Al2O3
(Change of Electrical Properties of Rutile- and Anatase-TiO2 Films By Atomic Layer Deposited Al2O3)

Toshihide Nabatame, Ippei Yamamoto, Tomomi Sawada, Akihiko Ohi, Thang Duy Dao, Tomoji Ohishi, Tadaaki Nagao.

ECS Transactions 92 [3] 15-21. 2019.

https://doi.org/10.1149/09203.0015ecst

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2019-10-22 03:04:18 +0900 Updated at: 2026-10-30 04:48:49 +0900

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