SAMURAI - NIMS Researchers Database

HOME > Article > Detail

Change of Electrical Properties of Rutile- and Anatase-TiO2 Films by Atomic Layer Deposited Al2O3
(Change of Electrical Properties of Rutile- and Anatase-TiO2 Films By Atomic Layer Deposited Al2O3)

Toshihide Nabatame, Ippei Yamamoto, Tomomi Sawada, Akihiko Ohi, Thang Duy Dao, Tomoji Ohishi, Tadaaki Nagao.
ECS Transactions 92 [3] 15-21. 2019.
https://doi.org/10.1149/09203.0015ecst

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

    Created at: 2019-10-22 03:04:18 +0900Updated at: 2025-01-09 04:50:37 +0900

    ▲ Go to the top of this page